EUV mirror / soft X-ray mirror

We provide multi-layer mirrors and single-layer mirrors for EUV.

feature

We provide EUV mirrors that reflect EUV light with photon energy 10 eV - 1 keV (wavelength 120 nm - 1.2 nm) with high efficiency. This energy band mirror, also called soft X-ray or XUV light, is used in a wide range of fields such as industrial applications such as EUV lithography, ultra-high-speed physical and chemical research using high-order harmonics, astrophysics applications, and soft X-ray plasma observation. It is

Multilayer film mirrors are mainly used for direct incidence, and single-layer film mirrors are mainly used for oblique incidence.

design example

Typical specifications

We will design the substrate shape and coating according to your request.

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EUV multilayer mirror design example

This is a design example of a multilayer mirror for 20 eV - 150 eV (wavelength 60 nm - 8 nm).

Ru/B 4C multilayer mirror

(150 eV - 100 eV)

For 150 eV

For 120 eV

For 100 eV

Mo/Si multilayer mirror (95 eV - 70 eV)

For 90 eV

For 80 eV

Zr/AlSi multilayer mirror

(70 eV - 50 eV)

For 70 eV

For 60 eV

For 50 eV

SiC/Mg multilayer mirror

(45 eV - 20 eV)

For 40 eV

For 30 eV

For 20 eV

EUV multilayer mirror standard specifications

EUV single layer film mirror design example

This is a design example of a single-layer mirror for 10 eV - 1 keV (wavelength 120 nm - 1.2 nm).

Au Mirror

Ni mirror

Ru Mirror

SiC mirror

B 4 C Mirror

EUV single layer mirror standard specifications

Please feel free to contact us for inquiries such as an estimate.